Martina Corso

ORCID: 0000-0002-8592-1284

Researcher ID: B-7768-2014

Scopus ID: 7003757995

Tenured Scientist (CSIC)

+34 943 01 8778

Dr. Martina Corso (born in Italy in 1978) got her Master in Physics at the University of Trieste in 2002. She received then her PhD in Physics at the University of Zurich in December 2006. She is working in the field of Surface Science since 2001, when she pursued her Master thesis in the Surface Structure and Reactivity Group of Prof. G. Comelli (TASC laboratory, Trieste, IT). To the present date, she has worked in three different European laboratories (PhD in Zürich, Postdoc and Ikerbasque Fellow in San Sebastián, and Humboldt fellow in Berlin) and performed experiments on different synchrotron facilities in Europe (ELETTRA, SLS) and USA (ALS and SRC). Since March 2017, she occupies a Tenured Scientist position at the Spanish Research Council (CSIC) and she works at the NanoPhysics Laboratory (NanoLab) in the Material Physics Center in San Sebastián (Spain).

During her scientific career, she worked with various experimental techniques operating in ultra-high vacuum, as X-Ray photoelectron spectroscopy (XPS) and diffraction (XPD), Low energy electron diffraction (LEED) and Angle resolved Photoemission (ARPES) but she is specialized in Scanning Probe Techniques as STM and nc-AFM. Her expertise focuses on the characterization of the morphology and electronic structure of low dimensional nanoscale systems grown on metallic and thin insulating surfaces. She got known in the scientific community for the discovery of the Boron-Nitride Nanomesh, a thin two-dimensional insulating material. She pioneered then in the NanoLab two research lines dealing with the electronic properties of two-dimensional surface alloys and step lattices in curved crystals. During her PostDoc in Berlin she became expert on phenomena related to single-molecule physics. Currently she works on the bottom-up synthesis of functional organic materials, their electronic characterization at the atomic level and their possible transfer on technologically relevant surfaces.